Project information
Research and development and industrializartion of novel super hard nanocrystalline materials
- Project Identification
- ME 367
- Project Period
- 7/2000 - 6/2002
- Investor / Pogramme / Project type
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Ministry of Education, Youth and Sports of the CR
- Programme KONTAKT (ME+MEB)
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
Development and industrialization of new superhard nanocristalline TiN/AlN/SiN coatings in collaboration with the Institut for Inorganic Materials, Munich, Germany and SHM company will be realized. Department of Physical Electronics will specialize in monitoring of plasma processes running during the deposition of superhard coatings using preferable optical spectroscopy and probe methods. On the base of spectral and probe measurements we develop simple detectors making possible to monitor plasmachemical processes in order to obtain superhard coatings with optimal mechanical properties. Moreover, the microwave experimetal set-up (the ASTEX type) for the depositon od diamond-like coatings, BN type will be arranged at MU. We also develop other deposition device generating plasma with homogenuos radial profile. A new high frequency generator with inductively coupled plasma for the deposition of nanocomposite materials like CN/SiO and CN/SiN will be developed, too.
Publications
Total number of publications: 24
2001
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Deposition of hard carbon films and its diagnostics
Juniormat'01, year: 2001
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Determination of Mechanical Properties of Thin Films by the Indentation Techniques
New Trends in Physics, year: 2001
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Diagnostics and monitoring of TiN/AlN deposition process
Year: 2001, type: R&D Presentation
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Modification of Plasma Deposited DLC Films by Hexamethyldisiloxane Addition
Proceedings of 13th Symposium on Application of Plasma Processes, year: 2001
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Optical diagnostics of inductively coupled RF discharge
SAPP 13th Symposium Proceedings, year: 2001
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Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds
Proceedings of 15th International Symposium on Plasma Chemistry, year: 2001
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Preparation of enhanced CN-based hard coatings by PECVD
Proceedings of 15th International Symposium on Plasma Chemistry, year: 2001
2000
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Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
Diamond and Related Materials, year: 2000, volume: 9, edition: 7
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HF-Plasma Pencil in Liquids
Czechoslovak Journal of Physics, year: 2000, volume: 50, edition: S3
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Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge
Czechoslovak Journal of Physics, year: 2000, volume: 2000, edition: 50(S3)