Project information
Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
- Project Identification
- VS96084
- Project Period
- 7/1996 - 12/2000
- Investor / Pogramme / Project type
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Ministry of Education, Youth and Sports of the CR
- Support to University Research Programmes
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
- Keywords
- joint laboratory, young scientist, plasmachemistry, chemical kinetics, hard materials, PECVD, protective coatings, high-pressure discharge, ignition of poor mixtures, removal of toxic waste
The goal of the project is to create joint laboratories which will permit young scientific staff of Fac. of Sciences, MU, Fac. of Pedagogy, MU, Military Academy and Institute of Plasma Physics of AS to participate in the research (collaboration since 199) supported by three grants of the Grant Agency of Czech Republic.The research will be focused on studies of kinetics of plasmachemicalreactions and processes, mainly those involved during deposition of thin films (layers of hard and superhard materials,optically transparent oxinitride and oxicarbide layers, ceramic and polymeric layers based on organometals). The inherent part of the research will be the determination of electrical, mechanical and optical properties of these materials. New means ofignition of very poor mixtures in combustion engines using high-pressure gliding discharge will be developed. Research and development of new plasmachemical devices and technologies, capable of removal of highly toxic wastes, produced by the Army.
Publications
Total number of publications: 55
1999
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Capacitive RF-discharge reactor for carbon-free iron preparation
Sborník CHISA 99, year: 1999
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Comparison of optical and non-optical methods for measuring surface roughness
Proceedings of SPIE 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, year: 1999
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Complete Optical Characterization of the SiO2/Si System by Spectroscopic Ellipsometry Spectroscopic Reflectometry and Atomic Force Microscopy
Surface and Interface Analysis, year: 1999, volume: 28, edition: 1
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DC AC and HF Plasma Pencil - New Possibilities for Plasma Surface and Liquid Treatment at Atmospheric Pressure
Progress in Plasma Processing of Materials, year: 1999
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Dependence of electron concetration in nitrogen afterglow on impurities
Proceedings of 14th International Symposium on Plasma Chemistry, year: 1999
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HF plasma pencil- new source for plasma surface processing
Surface and coating technology, year: 1999, volume: 1999, edition: 116-119
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Plazmochemicka depozice oteruvzdornych tenkych vrstev na plastickych materialech
Jemná mechanika a optika, year: 1999, volume: 1999, edition: 7-8
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Plazmová depozice ochranných vrstev na bázi uhlíku
Materiálové vědy na prahu 3. milénia, year: 1999
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Relationship Between AFM and Optical Measurements at Analyzing Surface Roughness
Jemná mechanika a optika, year: 1999, volume: 44, edition: 10
1998
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Comparison of AFM and optical methods at measuring nanometric surface roughness
Proceedings of the 3th Seminar on Quantitative Microscopy, year: 1998