Project information
Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
- Project Identification
- VS96084
- Project Period
- 7/1996 - 12/2000
- Investor / Pogramme / Project type
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Ministry of Education, Youth and Sports of the CR
- Support to University Research Programmes
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
- Keywords
- joint laboratory, young scientist, plasmachemistry, chemical kinetics, hard materials, PECVD, protective coatings, high-pressure discharge, ignition of poor mixtures, removal of toxic waste
The goal of the project is to create joint laboratories which will permit young scientific staff of Fac. of Sciences, MU, Fac. of Pedagogy, MU, Military Academy and Institute of Plasma Physics of AS to participate in the research (collaboration since 199) supported by three grants of the Grant Agency of Czech Republic.The research will be focused on studies of kinetics of plasmachemicalreactions and processes, mainly those involved during deposition of thin films (layers of hard and superhard materials,optically transparent oxinitride and oxicarbide layers, ceramic and polymeric layers based on organometals). The inherent part of the research will be the determination of electrical, mechanical and optical properties of these materials. New means ofignition of very poor mixtures in combustion engines using high-pressure gliding discharge will be developed. Research and development of new plasmachemical devices and technologies, capable of removal of highly toxic wastes, produced by the Army.
Publications
Total number of publications: 55
2001
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XPS and Ellipsometric Study of DLC/Silicon Interface
Vacuum, year: 2001, volume: 61, edition: 2-4
2000
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A New Type of Ignition of Fuel Mixtures in Spark Ignition Engines by High Pressure Gliding Discharge
International Symposium, on High Pressure Low Temperature Plasma Chemistry- HAKONE VII, Greifswald-Germany 2000, Contributed Papers, year: 2000
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Additional microwave diagnostics of afterglow with ESR spectrometer
Microwave discharges: fundamentals and applications, year: 2000
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Analysis of Slightly Rough Thin Films by Optical Methods and AFM
Mikrochim. Acta, year: 2000, volume: 132, edition: 1
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Analysis of thin films by optical multi-sample methods
Acta Physica Slovaca, year: 2000, volume: 50, edition: 4
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Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films
Proceedings of the 4th Seminar on Quantitative Microscopy, year: 2000
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Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
Diamond and Related Materials, year: 2000, volume: 9, edition: 7
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Ellipsometry of Thin Film Systems
Progress in Optics, Vol. 41 (Ed. E. Wolf), edition: Vyd. 1, year: 2000, number of pages: 102 s.
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HF-Plasma Pencil in Liquids
Czechoslovak Journal of Physics, year: 2000, volume: 50, edition: S3
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Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge
Czechoslovak Journal of Physics, year: 2000, volume: 2000, edition: 50(S3)