HF plasma pencil- new source for plasma surface processing

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Authors	JANČA Jan ZAJÍČKOVÁ Lenka KLÍMA Miloš SLAVÍČEK Pavel
Year of publication	1999
Type	Article in Periodical
Magazine / Source	Surface and coating technology
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	plasma pencil; atmospheric discharge; diagnostic
Description	HF plasma pencil=new source for plasma surface treatment.
Related projects:	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Hard and superhard coatings prepared by unconventional plasma processes Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates