Controlled high temperature stability of microwave plasma synthesized graphene nanosheets

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Publikace nespadá pod Ekonomicko-správní fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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JAŠEK Ondřej TOMAN Jozef VŠIANSKÝ Dalibor JURMANOVÁ Jana ŠNÍRER Miroslav HEMZAL Dušan BANNOV Alexander G HAJZLER Jan SŤAHEL Pavel KUDRLE Vít

Rok publikování 2021
Druh Článek v odborném periodiku
Časopis / Zdroj Journal of physics D: Applied physics
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://doi.org/10.1088/1361-6463/abdb6d
Doi http://dx.doi.org/10.1088/1361-6463/abdb6d
Klíčová slova graphene; microwave plasma; thermal stability; defects; oxidation resistance
Přiložené soubory
Popis High temperature stability of nanomaterials plays an important role for their application in the field of nanocomposites, batteries, and sensors. Few-layer graphene nanosheets prepared by microwave plasma based decomposition of ethanol exhibited high thermal stability in the oxidation atmosphere in dependence on controlled formation of structural disorder. Analysis of differential thermogravimetry (DTG) curve profile showed three temperature regions, around 345 degrees C, 570 degrees C and above 700 degrees C, related to amorphous phase with a carbon-oxygen functional groups, small defective nanostructures and highly crystalline structure of graphene nanosheets, respectively. Raman spectroscopy and x-ray photoelectron spectroscopy (XPS) analysis of the nanosheets showed an increase of D/G Raman band ratio as well as increasing of sp(3) phase content, from 6.1 at% to 15.2 at%, for highly crystalline and highly disordered structure of the nanosheets. Thermal annealing under synthetic air was used to investigate the variation in D/G and 2D/G Raman band ratio of the samples and to estimate activation energy of oxidation and disintegration process of graphene nanosheets. The highest oxidation resistance exhibited sample with high 2D/G band ratio (1.54) and lowest oxygen content of 1.7 at%. The synthesis process led to stabilization of nanosheet structure by formation of curved edges and elimination of free dangling bonds. The nanosheets prepared in microwave plasma exhibited high surface area, over 350 m(2) g(-1), and superior thermal stability with defect activation energy in an oxidation atmosphere higher than 2 eV. Heat release rate during the oxidation process was in correlation with the amount of disorder in the samples. Fast and easy to use technique based on high power Raman spectroscopy was developed for assessment of nanomaterial oxidation resistance.
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