Revisiting particle dynamics in HiPIMS discharges. I. General effects

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Publikace nespadá pod Ekonomicko-správní fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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HNILICA Jaroslav KLEIN Peter VAŠINA Petr SNYDERS Rony BRITUN Nikolay

Rok publikování 2020
Druh Článek v odborném periodiku
Časopis / Zdroj Journal of applied physics
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www http://aip.scitation.org/doi/10.1063/5.0009378
Doi http://dx.doi.org/10.1063/5.0009378
Klíčová slova magnetron sputtering; HiPIMS; spectroscopy; plasma diagnostics; sputtering process; LIF; AAS
Popis A detailed experimental study of high power impulse magnetron sputtering processes is performed by time-resolved imaging of the ground state sputtered particles. New details related to the behavior of both neutral and singly ionized atoms are shown, as a result of separate treatment of the plasma-on and plasma-off time phases. In Paper I, the ion/neutral density redistribution in the ionization zone during sputtering is analyzed; the role of main discharge parameters, such as pulse repetition rate, pulse energy, etc., is discussed systematically. The time-resolved evolution of the ground state levels population for both sputtered neutrals and ions is also considered. In addition, propagation of the sputtered particles is analyzed using 2D density gradient diagrams calculated based on the measured particle density distributions. The results of this work are compared, when possible, to the data obtained previously [Britun et al., J. Appl. Phys. 117, 163302 (2015)].
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