Plasma treatment of silicon surface by DCSBD

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Authors

SKÁCELOVÁ Dana SŤAHEL Pavel HANIČINEC Martin ČERNÁK Mirko

Year of publication 2011
Type Article in Periodical
Magazine / Source Acta Technica CSAV
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Silicon surface plasma treatment DBD discharge AFM contact angle measurement
Description This paper focuses on the plasma treatment of crystalline Si (100) surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure using ambient atmosphere. Surface free energy of silicon was investigated by contact angle measurement and surface morphology was studied by Atomic force microscope. Plasma treatment increases the surface wettability and AFM measurements showed that the plasma influences also the surface roughness.
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