Plasma treatment of silicon surface by DCSBD

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Authors	SKÁCELOVÁ Dana SŤAHEL Pavel HANIČINEC Martin ČERNÁK Mirko
Year of publication	2011
Type	Article in Periodical
Magazine / Source	Acta Technica CSAV
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	Silicon surface plasma treatment DBD discharge AFM contact angle measurement
Description	This paper focuses on the plasma treatment of crystalline Si (100) surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure using ambient atmosphere. Surface free energy of silicon was investigated by contact angle measurement and surface morphology was studied by Atomic force microscope. Plasma treatment increases the surface wettability and AFM measurements showed that the plasma influences also the surface roughness.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Preparation of nano-films and nano-coatings on textiles using plasma surface treatment at atmospheric pressure