Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere
| Authors | |
|---|---|
| Year of publication | 2010 |
| Type | Article in Proceedings |
| Conference | Potential and Applications of Nanotretment of Medical Surface |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | magnetron sputtering; modelling; hybrid process; hysteresis |
| Description | Hybrid PVD-PECVD sputtering process was studied for the case of titanium target sputtering in argon and acetylene atmosphere. The hybrid PVD-PECVD process combines aspects of conventional sputtering of metal target with hydrocarbon vapour as a source of carbon. We present and discuss significant differences between behaviour of conventional reactive magnetron sputtering and such hybrid process. |
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