Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere

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Authors

SCHMIDTOVÁ Tereza VAŠINA Petr

Year of publication 2010
Type Article in Proceedings
Conference Potential and Applications of Nanotretment of Medical Surface
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords magnetron sputtering; modelling; hybrid process; hysteresis
Description Hybrid PVD-PECVD sputtering process was studied for the case of titanium target sputtering in argon and acetylene atmosphere. The hybrid PVD-PECVD process combines aspects of conventional sputtering of metal target with hydrocarbon vapour as a source of carbon. We present and discuss significant differences between behaviour of conventional reactive magnetron sputtering and such hybrid process.
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