Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously

Vašina,  Petr; Schmidtová,  Tereza

Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously

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Authors	VAŠINA Petr SCHMIDTOVÁ Tereza
Year of publication	2009
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously, proceeding
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