Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

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Authors

VAŠINA Petr SCHMIDTOVÁ Tereza ELIÁŠ Marek

Year of publication 2009
Type Article in Periodical
Magazine / Source Plasma Sources Science and Technology
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords magnetron sputtering; reactive; Berg
Description The paper model reactive magnetron sputtering deposition process by modified Bergs model. We test also role of different temperature conditions on hysteresys behaviour and role of non-uniform discharge current density.
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