Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process

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Authors

DVOŘÁK Pavel VAŠINA Petr

Year of publication 2008
Type Article in Proceedings
Conference Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords higher harmonics; plasma; discharge; reactive sputtering; magnetron
Description A new method to control whether a radio-freguency (RF) reactive sputtering deposition processes runs in a pre-adjusted experimental conditions was proposed. The frequency spectrum of the cathode voltage and of the voltage on an uncompensated probe immersed in the plasma was measured and it was proved, that some of the harmonics are extremely sensitive markers of the transition between the metallic and the compound mode of the RF sputtering.
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