Plasma enhanced CVD of hard DLC/SiOx coatings from methane and hexamethyldisiloxane
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | 17th International Symposium on Plasma Chemistry |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | DLC; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD |
| Description | In present paper we give some new results on our previously reported hard DLC/SiOx films deposited from the mixtures of CH4 and HMDSO and compare them with similar films deposited from CH4/HMDSO/H2 mixtures using a different generator. We show that significant drawbacks of the DLC films, high intrinsic stress, bad thermal stability and absorption in the visible range, can be limited by an incorporation of the SiOx component and we notice that this conclusion is achieved for many DLC/SiOx films in spite of the different method of preparation and, more surprisingly, of their different structure. However, particular film properties can be further improved by an optimization of the deposition conditions as concluded from the higher hardness of the films deposited from the CH4/HMDSO/H2 compared to the CH4/HMDSO feed. |
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