Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison

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Authors	SONNENFELD Axel TUN T. M. ZAJÍČKOVÁ Lenka KOZLOV K. V. WAGNER H.-E. BEHNKE J. F. HIPPLER R.
Year of publication	2001
Type	Article in Periodical
Magazine / Source	Plasmas and Polymers
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	DBD
Description	Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
Related projects:	Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used