The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge

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Authors	SONNENFELD Axel TUN T. M. ZAJÍČKOVÁ Lenka WAGNER Hans-Erich BEHNKE J. B. HIPPLER R.
Year of publication	2001
Type	Article in Proceedings
Conference	Proceedings of 15th International Symposium on Plasma Chemistry
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Description	The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge
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