Antireflexní vrstva na substrátu ve specifikaci T>=99,8 %@ 248 nm a T>=98,5 % @ 213 nm.
| Title in English | Antireflection coating on the substrate in specification: T>=99,8 % at 248 nm and T>=98,5 % at 213 nm. |
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| Authors | |
| Year of publication | 2020 |
| MU Faculty or unit | |
| Description | Antireflection coating layers fabricated in combination of high index Al2O3 and low index SiO2 materials with following specification in deep ultraviolet region, design 1: T>=99,8 % at 248 nm and design 2: T>=98,5 % at 213 nm |
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