Antireflexní vrstva na substrátu ve specifikaci T>=99,8 %@ 248 nm a T>=98,5 % @ 213 nm.

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Title in English Antireflection coating on the substrate in specification: T>=99,8 % at 248 nm and T>=98,5 % at 213 nm.
Authors

PEKAŘ Václav BŘEZINA Jaromír ŠKODA David OHLÍDAL Ivan VOHÁNKA Jiří FRANTA Daniel FRANTA Pavel OHLÍDAL Miloslav ŠULC Václav KLAPETEK Petr HAVLÍČEK Marek

Year of publication 2020
MU Faculty or unit

Faculty of Science

Description Antireflection coating layers fabricated in combination of high index Al2O3 and low index SiO2 materials with following specification in deep ultraviolet region, design 1: T>=99,8 % at 248 nm and design 2: T>=98,5 % at 213 nm
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