Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

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Authors	FALUB Claudiu V. ROHRMANN Hartmut BLESS Martin MEDUŇA Mojmír MARIONI Miguel SCHNEIDER Daniel RICHTER Jan H. PADRUN Marco
Year of publication	2017
Type	Article in Periodical
Magazine / Source	AIP Advances
MU Faculty or unit	Faculty of Science
Citation
Web	http://aip.scitation.org/doi/abs/10.1063/1.4973945
Doi	http://dx.doi.org/10.1063/1.4973945
Field	Solid matter physics and magnetism
Keywords	ferromagnetic-resonance frequency; on-chip inductors; x-ray-scattering; thin-films; roughness; anisotropy; band
Description	Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.
Related projects:	CEITEC - Central European Institute of Technology CEITEC 2020