Mechanical Properties of Ultrananocrystalline Thin Films Deposited Using Dual Frequency Discharges

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Authors	BURŠÍKOVÁ Vilma BLÁHOVÁ Olga KARÁSKOVÁ Monika ZAJÍČKOVÁ Lenka JAŠEK Ondřej FRANTA Daniel KLAPETEK Petr BURŠÍK Jiří
Year of publication	2011
Type	Article in Periodical
Magazine / Source	CHEMICKÉ LISTY
MU Faculty or unit	Faculty of Science
Citation
Web	http://www.chemicke-listy.cz/docs/full/2011_14_s98-s101.pdf
Field	Plasma physics
Keywords	ultrananocrystalline diamond; plasma enhanced chemical vapor deposition; dual frequency discharge; local mechanical properties
Description	The present paper describes the deposition of nanostruc- tured diamond films with low surface roughness, high hard- ness and fracture toughness by microwave PECVD in the ASTeX type reactor from mixture of methane and hydrogen. Films were deposited on a mirror polished (111) oriented n- doped silicon substrate. The film exhibited relatively low roughness, the root mean square (RMS) of heights ranged from 20 to 9.1 nm, depending on the deposition conditions. The hardness was found to be in the range from 22 to 65 GPa and the elastic modulus ranged from 220 to 375 GPa, depend- ing on the film structure
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges Nanometrologie využívající metod rastrovací sondové mikroskopie