Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.
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Year of publication | 2010 |
Type | Conference abstract |
MU Faculty or unit | |
Citation | |
Description | Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process. |
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