Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.

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Authors

SCHMIDTOVÁ Tereza VAŠINA Petr

Year of publication 2010
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process.
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