Interdiffusion in Ge rich SiGe/Ge multilayers studied by in situ diffraction

Investor logo
Investor logo

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

MEDUŇA Mojmír CAHA Ondřej KEPLINGER Mario STANGL Julian BAUER Günther MUSSLER Gregor GRÜTZMACHER Detlev

Year of publication 2009
Type Article in Periodical
Magazine / Source Physica stat.sol.(a)
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords interdiffusion; x-ray diffraction; multilayers
Description We have investigated SiGe/Si multilayers with Ge content 70% and 90% annealed in-situ at temperatures in the range 600-700 C by x-ray diffraction.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.