High temperature investigations of Si/SiGe based cascade structures using x-ray scattering methods

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Authors

MEDUŇA Mojmír NOVÁK Jiří FALUB Claudiu CHEN Gang BAUER Günther TSUJINO Soichiro GRÜTZMACHER Detlev MÜLLER Elisabeth CAMPIDELLI Yves KERMARREC Olivier BENSAHEL Daniel SCHELL Norbert

Year of publication 2005
Type Article in Periodical
Magazine / Source J. Phys. D: Appl. Phys.
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords X-ray reflectivity; SiGe; Annealing; Diffusion
Description Temperature stability of SiGe/Si (80% Ge) structures was studied using x-ray reflectivity during in-situ annealing around temperature 790C.
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