High temperature investigations of Si/SiGe based cascade structures using x-ray scattering methods

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Authors	MEDUŇA Mojmír NOVÁK Jiří FALUB Claudiu CHEN Gang BAUER Günther TSUJINO Soichiro GRÜTZMACHER Detlev MÜLLER Elisabeth CAMPIDELLI Yves KERMARREC Olivier BENSAHEL Daniel SCHELL Norbert
Year of publication	2005
Type	Article in Periodical
Magazine / Source	J. Phys. D: Appl. Phys.
MU Faculty or unit	Faculty of Science
Citation
Field	Solid matter physics and magnetism
Keywords	X-ray reflectivity; SiGe; Annealing; Diffusion
Description	Temperature stability of SiGe/Si (80% Ge) structures was studied using x-ray reflectivity during in-situ annealing around temperature 790C.
Related projects:	Physical and chemical properties of advanced materials and structures Physical properties of new materials and layered structures