Electron density measurements in afterglow of high power pulsed microwave discharge

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	MEŠKO Marcel BONAVENTURA Zdeněk VAŠINA Petr TÁLSKÝ Antonín FRGALA Zdeněk KUDRLE Vít JANČA Jan
Year of publication	2004
Type	Article in Periodical
Magazine / Source	Plasma Sources Sci. Technol.
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	eedf; pulsed high power microwaves; afterglow; microwave interferometry
Attached files	psst4_4_002.pdf
Description	In the paper we study, be means of microwave interferometry, the evolution of electron density in afterglow of pulsed driven nitrogen discharge. Recombination coeffients are derived, too.
Related projects:	Study of plasmachemical processes using microwave and optical spectroscopy Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates