X-ray reflectivity study of a W/Si multilayer grating

Investor logo

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

JERGEL M. FALCONY C. MIKULÍK Petr ORTEGA L. MAJKOVÁ E. PINČÍK E. LUBY Š. KOSTIČ I. HUDEK P.

Year of publication 2001
Type Article in Periodical
Magazine / Source Superficies y Vacío
MU Faculty or unit

Faculty of Science

Citation
Web http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001
Field Solid matter physics and magnetism
Keywords reflectivity; xrr; x-uv optics; gratings; w/si; x-ray
Description Multilayer gratings are artificially patterned multilyer thin films with the periodicities both in the lateral and normal directions which renders them attracting for microelectronic and optical applications. A proper structural characterization is of primary importance. To test the capability of the X-ray reflectometry technique to fulfil this task, a tungsten/silicon multilayer grating prepared by electron beam evaporation and electron beam lithography was studied both in the coplanar and non-coplanar geometries., the nominal lateral and normal periods being 800 nm and 8 nm, respectively. The coplanar measurements were evaluated within the dynamical theory of X-ray scattering on rough gratings and provided the structural parameters of a real structure with a reasonable precision which are close to the nominal ones. The results revealed also some imperfections of the deposition and masking procedures which are discussed. The non-coplanar measurements were evaluated qualitatively using three-dimensional constructions in the reciprocal space. The advantage of the technique used is its non-destructive character and a simultaneous access both to the surface shape of the grating as well as to its internal structure.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.