Langmuir probe without RF compensation
| Authors | |
|---|---|
| Year of publication | 2022 |
| Type | Article in Periodical |
| Magazine / Source | Plasma Sources Science and Technology |
| MU Faculty or unit | |
| Citation | |
| Web | https://iopscience.iop.org/article/10.1088/1361-6595/ac83eb |
| Doi | http://dx.doi.org/10.1088/1361-6595/ac83eb |
| Keywords | plasma; Langmuir probe; uncompensated probe; plasma potential; CCP |
| Description | Langmuir probes with RF compensation are used for measurements of electron concentration, electron temperature and the DC value of plasma potential in RF discharges. In order to obtain all the RF components of plasma potential, simple probes without RF compensation are used. However, it has been believed that these uncompensated probes can not be used for determination of the DC value of plasma potential and of electron concentration and temperature, since their VA characteristics is distorted by the RF current. Consequently, the evaluation of data measured with uncompensated probes was not possible without additional measurement with a RF compensated Langmuir probe. This contribution analyzes the possibility to use uncompensated probes not only for measurement of RF components of plasma potential, but also for measurement of the DC component of plasma potential, electron concentration and electron temperature. |
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