Zařízení pro zvýšení depoziční rychlosti HiPIMSu použitím balíčků pulzů
| Title in English | Device for deposition rate increase in HiPIMS using pulse packages |
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| Authors | |
| Year of publication | 2020 |
| Type | Outcomes put into operation (prototype, working sample) |
| MU Faculty or unit | |
| Description | As a part of the TAČR project, we have developed a device for deposition rate increase in HiPIMS using pulse packages. The measured plasma parameters showed that the device is capable to double the deposition rate while the ionization fraction of sputtered species remain the same. |
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