Cathode voltage and discharge current oscillations in HiPIMS

Investor logo
Investor logo

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

KLEIN Peter HNILICA Jaroslav HUBIČKA Zdeněk ČADA Martin ŠLAPANSKÁ Marta ZEMÁNEK Miroslav VAŠINA Petr

Year of publication 2017
Type Article in Periodical
Magazine / Source Plasma Sources Science and Technology
MU Faculty or unit

Faculty of Science

Citation
Web http://iopscience.iop.org/article/10.1088/1361-6595/aa62ee
Doi http://dx.doi.org/10.1088/1361-6595/aa62ee
Field Plasma physics
Keywords HiPIMS; voltage and current oscillations; spokes
Description This paper reports on the oscillations both on the cathode voltage and on the discharge current which emerged suddenly and simultaneously during a high-power impulse magnetron sputtering pulse. Detailed experiments identified the pressure and the discharge current ranges to detect these oscillations. The oscillations originated from the magnetized plasma and their frequency ranged from 225 kHz to 400 kHz depending on the experimental conditions. Simultaneous measurement of both oscillations and spokes was conducted to find mutual correlations. The oscillations always accompanied the spokes and no particular conditions to detect oscillations in the absence of spokes were found. The oscillations were not caused by the rotational motion of the spokes but emerged when a certain threshold amount of spokes was overreached.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.