Deposition of thin zinc films by atmospheric pressure plasma jet in aqueous media
| Authors | |
|---|---|
| Year of publication | 2016 |
| Type | Article in Proceedings |
| Conference | Hakone XV: International Symposium of High Pressure low Temperature Plasma Chemistry |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | atmospheric plasma jet; thin film deposition; zinc |
| Description | Argon plasma jet was operated at atmospheric pressure in contact with aqueous solution of a zinc salt in order to deposit thin films on silicon substrates immersed in the liquid. The thickness of the films was determined by a profilometer while the chemical composition was analysed by XPS technique. The experiments revealed the importance of the submersion depth of the substrate which strongly affects the energy and particle influx. |
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