Zařízení pro měření tloušťky polovodičových vrstevnatých struktur SOI
| Title in English | Apparatus to measure thickness of SOI semiconductor layered structures |
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| Authors | |
| Year of publication | 2014 |
| MU Faculty or unit | |
| Web | http://spisy.upv.cz/UtilityModels/FullDocuments/FDUM0027/uv027013.pdf |
| Description | Technical solution targets measurements of thickness of SOI layered semiconductor structures through optical means in VIS/NIR range with precision of 30 nm in 1-10 micron range; it comprises a light source, optical fibers, scanner, spectrometer, control electronics and computer |
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