Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators

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Authors

KORYTÁR D. VAGOVIČ P. FERRARI C. ŠIFFALOVIČ P. JERGEL M. DOBROČKA E. ZÁPRAŽNÝ Z. ÁČ V. MIKULÍK Petr

Year of publication 2013
Type Article in Proceedings
Conference Advances in X-Ray/EUV Optics and Components VIII
MU Faculty or unit

Central European Institute of Technology

Citation
Web http://www.sci.muni.cz/~mikulik/Publications.html#KorytarVagovicFerrari-SPIE-2013
Doi http://dx.doi.org/10.1117/12.2025142
Field Solid matter physics and magnetism
Keywords Bragg magnifier; X-ray diffraction; crystals
Description Beam inhomogeneities of asymmetric Ge(220)-based V-shaped and single bounce monochromators have been studied both in metrological and imaging applications for photon energies around 8 keV. Presence of growth striations in graded GeSi, grains in single Cu crystal, and strains in thermally tuned V-channel monochromators observed in X-ray topographs excludes these materials from imaging applications. As for stochastic surface processing, chemomechanical polishing (CMP) produces better surface homogeneity than chemical polish. However, CMP is more difficult to be applied in V-channels, where chemical polishing is prefered. For comparison, measurements on surfaces processed by a deterministic mechanical method of single point diamond turning (SPDT) have shown SPDT to be a perspective technology. Again, to prepare deep grooves with this technique is also a challenge, mainly for tool makers. Some process induced features are observed as wavefield distortions in interference fringes.
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