Magnetron sputtering at CEPLANT project

Investor logo
Investor logo

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

VAŠINA Petr

Year of publication 2012
Type Article in Proceedings
Conference Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Magnetron sputtering
Description Magnetron sputtering belongs to the most industrially attractive methods for thin film deposition. Magnetron cathodes can be produced several meters long which makes the method very suitable for large area deposition. We presents activity related to magnetron sputtering group performed within the CEPLANT project, research topics, current equipment as well as properties of the sputtering system which is being acquired as one of the core devices of the CEPLANT project.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.