Feedback system to control reactive magnetron sputtering
| Authors | |
|---|---|
| Year of publication | 2012 |
| Type | Article in Proceedings |
| Conference | Potential and Applications of Surface Nanothreatment of Polymers and Glass |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | sputtering; magnetron; hysteresis |
| Description | The process of reactive magnetron sputtering of titanium with oxygen inlet was studied. Thanks to feedback system Speedflo the process was able to stabilise itself in former unstable hysteresis region. The results of the experiments in hysteresis region let to improvements in theoretical model based on Berg’s model. |
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