Feedback system to control reactive magnetron sputtering

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Authors

KLEIN Peter VAŠINA Petr SCHMIDTOVÁ Tereza

Year of publication 2012
Type Article in Proceedings
Conference Potential and Applications of Surface Nanothreatment of Polymers and Glass
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords sputtering; magnetron; hysteresis
Description The process of reactive magnetron sputtering of titanium with oxygen inlet was studied. Thanks to feedback system Speedflo the process was able to stabilise itself in former unstable hysteresis region. The results of the experiments in hysteresis region let to improvements in theoretical model based on Berg’s model.
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