Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

JAN Mistrík OHLÍDAL Ivan ANTOŠ Roman AOYAMA Mitsuru YAMAGUCHI Tomuo

Year of publication 2005
Type Article in Periodical
Magazine / Source Applied Surface Science
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords ellipsometry; reflectometry; ion plating; SiO2/glass interface; change of refractive index; plasma-assisted deposition; Schott B270
Description High-density reactive ion plating was used for SiO2 coating of Schott B270 glass. Optical properties of the sample were intensively studied by spectroscopic ellipsometry, reflectance and transmittance. Several optical models accounting for different structural defects, i.e., (1) gradient profile of refractive index in SiO2 layer, (2) transition layer between SiO2 and glass, and (3) induced slow variation of glass refractive index close to SiO2/glass interface were considered. The last one with increased value of substrate refractive index gave the best correspondence with the experimental data. (c) 2004 Elsevier B.V. All rights reserved.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.