Thermal stability of SiOxCyHz films prepared by PECVD

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Authors	KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma ZAJÍČKOVÁ Lenka FRANCLOVÁ Jana PEŘINA Vratislav
Year of publication	2005
Type	Article in Periodical
Magazine / Source	Chemické listy
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	thermal stability; TDS; PECVD; FTIR; RBSW; ERDA
Description	Thermal stability of SiOxCyHz films prepared using PECVD was studied by TDS, FTIR, RBS, ERDA and spectroscopic elipsometry.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface