Thermal stability of SiOxCyHz films prepared by PECVD

Warning

This publication doesn't include Faculty of Economics and Administration. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

KUČEROVÁ Zuzana BURŠÍKOVÁ Vilma ZAJÍČKOVÁ Lenka FRANCLOVÁ Jana PEŘINA Vratislav

Year of publication 2005
Type Article in Periodical
Magazine / Source Chemické listy
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords thermal stability; TDS; PECVD; FTIR; RBSW; ERDA
Description Thermal stability of SiOxCyHz films prepared using PECVD was studied by TDS, FTIR, RBS, ERDA and spectroscopic elipsometry.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.