Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses

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Authors	ZAJÍČKOVÁ Lenka OHLÍDAL Ivan JANČA Jan
Year of publication	1996
Type	Article in Periodical
Magazine / Source	Thin Solid Films
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	PECVD; TEOS
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates