Temporal evolution of Ti sputtered species number densities in multi-pulse HiPIMS process
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| Year of publication | 2017 |
| Type | Conference abstract |
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| Citation | |
| Description | The aim of this paper is to study the temporal evolutions of sputtered species number densities during a preceding (P) and a subsequent (S) pulse in a multi-pulse HiPIMS. The Ti atom number density does not reach the maximum at the time of the maximal discharge current. It is shown that the residual particles from the P pulse are presented at the beginning of the S pulse even for the longest studied delay between the P and the S pulse. The ionization fractions of sputtered species attained at the end of the S pulses are always lower compared to the P pulse. The coatings produced by multi-pulse HiPIMS exhibited decreased roughness and increased hardness in comparison with standard HiPIMS and DC magnetron sputtered coating. |
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