Atomic layer deposition on plasma pre-treated flexible polymer surfaces

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Authors

KRUMPOLEC Richard HOMOLA Tomáš CAMERON David Campbell ČERNÁK Mirko

Year of publication 2016
Type Chapter of a book
MU Faculty or unit

Faculty of Science

Citation
Description In this work, we deposited an ultra-thin layer of TiO2 by atomic layer deposition (ALD) with a low number of cycles, up to 100. This led to non-uniform film with thickness less than several nm.
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